マシンタイプ
plasma sputter coating machine
次元(L*W*H)
500mm*320mm*470mm
Application
Multifunctional Metal Film
Technology
Plasma Sputtering
Chamber size
DIA 180mm x 210mm
Chamber material
High Purity Quartz
Distance to the sputtering target
20mm~35mm adjustable
DC sputtering target head
2 inches
Max. sputtering current
50mA