適用
Semiconductor Glass Coating
技術
Vacuum melting, forging,
処理サービス
曲げ, 溶接, Decoiling, 切断, パンチ
Product name
titanium target
Purity
4N (99.99%), 4N5 (99.995%)
Grain Sizes
< 50 micron or on request
Keyword
titanium sputtering target
Surface Treatment
Ra 1.6 Micron or on request